Pre-Treatment Apparatus For Waste Gas Treatment Apparatus

Pre-Treatment Apparatus For Waste Gas Treatment Apparatus

The invention discloses a pre-treatment apparatus for a waste gas treatment apparatus. A pretreatment apparatus for a waste gas treatment apparatus is disclosed. The pretreatment apparatus for waste gas treatment according to an embodiment of the present invention is a pretreatment apparatus for a s...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: JEONG HOON, KIM JIN UK, CHA YONG SUN, LEE KEUN SU
Format: Patent
Sprache:chi ; eng
Schlagworte:
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
SEPARATION
TRANSPORTING
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator JEONG HOON
KIM JIN UK
CHA YONG SUN
LEE KEUN SU
description The invention discloses a pre-treatment apparatus for a waste gas treatment apparatus. A pretreatment apparatus for a waste gas treatment apparatus is disclosed. The pretreatment apparatus for waste gas treatment according to an embodiment of the present invention is a pretreatment apparatus for a single body installed at the front end of a waste gas treatment apparatus capable of treating waste gas discharged from a semiconductor process. The apparatus comprises the following components: a main body, which is provided with an inlet for waste gas and an outlet for gas; a partition wall, which is disposed in the body so as to divide the inlet and the outlet; anti-adhering part, which is arranged at the inlet for supplying hot nitrogen and water for the main body in order to prevent powder adhering the inlet, and evaporating water contained in the waste gas; a filtering part, which is arranged in the main body, in order to remove powder, dust, impurity, water-soluble gas and the like contained in the waste gas;
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN106861351A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN106861351A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN106861351A3</originalsourceid><addsrcrecordid>eNrjZLAMKErVDSlKTSzJTc0rUXAsKEgsSiwpLVZwyy9SCE8sLklVcE8sVsCigoeBNS0xpziVF0pzMyi6uYY4e-imFuTHpxYXJCan5qWWxDv7GRqYWZgZGpsaOhoTowYADDIuQg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Pre-Treatment Apparatus For Waste Gas Treatment Apparatus</title><source>esp@cenet</source><creator>JEONG HOON ; KIM JIN UK ; CHA YONG SUN ; LEE KEUN SU</creator><creatorcontrib>JEONG HOON ; KIM JIN UK ; CHA YONG SUN ; LEE KEUN SU</creatorcontrib><description>The invention discloses a pre-treatment apparatus for a waste gas treatment apparatus. A pretreatment apparatus for a waste gas treatment apparatus is disclosed. The pretreatment apparatus for waste gas treatment according to an embodiment of the present invention is a pretreatment apparatus for a single body installed at the front end of a waste gas treatment apparatus capable of treating waste gas discharged from a semiconductor process. The apparatus comprises the following components: a main body, which is provided with an inlet for waste gas and an outlet for gas; a partition wall, which is disposed in the body so as to divide the inlet and the outlet; anti-adhering part, which is arranged at the inlet for supplying hot nitrogen and water for the main body in order to prevent powder adhering the inlet, and evaporating water contained in the waste gas; a filtering part, which is arranged in the main body, in order to remove powder, dust, impurity, water-soluble gas and the like contained in the waste gas;</description><language>chi ; eng</language><subject>PERFORMING OPERATIONS ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; SEPARATION ; TRANSPORTING</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20170620&amp;DB=EPODOC&amp;CC=CN&amp;NR=106861351A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20170620&amp;DB=EPODOC&amp;CC=CN&amp;NR=106861351A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>JEONG HOON</creatorcontrib><creatorcontrib>KIM JIN UK</creatorcontrib><creatorcontrib>CHA YONG SUN</creatorcontrib><creatorcontrib>LEE KEUN SU</creatorcontrib><title>Pre-Treatment Apparatus For Waste Gas Treatment Apparatus</title><description>The invention discloses a pre-treatment apparatus for a waste gas treatment apparatus. A pretreatment apparatus for a waste gas treatment apparatus is disclosed. The pretreatment apparatus for waste gas treatment according to an embodiment of the present invention is a pretreatment apparatus for a single body installed at the front end of a waste gas treatment apparatus capable of treating waste gas discharged from a semiconductor process. The apparatus comprises the following components: a main body, which is provided with an inlet for waste gas and an outlet for gas; a partition wall, which is disposed in the body so as to divide the inlet and the outlet; anti-adhering part, which is arranged at the inlet for supplying hot nitrogen and water for the main body in order to prevent powder adhering the inlet, and evaporating water contained in the waste gas; a filtering part, which is arranged in the main body, in order to remove powder, dust, impurity, water-soluble gas and the like contained in the waste gas;</description><subject>PERFORMING OPERATIONS</subject><subject>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</subject><subject>SEPARATION</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLAMKErVDSlKTSzJTc0rUXAsKEgsSiwpLVZwyy9SCE8sLklVcE8sVsCigoeBNS0xpziVF0pzMyi6uYY4e-imFuTHpxYXJCan5qWWxDv7GRqYWZgZGpsaOhoTowYADDIuQg</recordid><startdate>20170620</startdate><enddate>20170620</enddate><creator>JEONG HOON</creator><creator>KIM JIN UK</creator><creator>CHA YONG SUN</creator><creator>LEE KEUN SU</creator><scope>EVB</scope></search><sort><creationdate>20170620</creationdate><title>Pre-Treatment Apparatus For Waste Gas Treatment Apparatus</title><author>JEONG HOON ; KIM JIN UK ; CHA YONG SUN ; LEE KEUN SU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN106861351A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2017</creationdate><topic>PERFORMING OPERATIONS</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>SEPARATION</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>JEONG HOON</creatorcontrib><creatorcontrib>KIM JIN UK</creatorcontrib><creatorcontrib>CHA YONG SUN</creatorcontrib><creatorcontrib>LEE KEUN SU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>JEONG HOON</au><au>KIM JIN UK</au><au>CHA YONG SUN</au><au>LEE KEUN SU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Pre-Treatment Apparatus For Waste Gas Treatment Apparatus</title><date>2017-06-20</date><risdate>2017</risdate><abstract>The invention discloses a pre-treatment apparatus for a waste gas treatment apparatus. A pretreatment apparatus for a waste gas treatment apparatus is disclosed. The pretreatment apparatus for waste gas treatment according to an embodiment of the present invention is a pretreatment apparatus for a single body installed at the front end of a waste gas treatment apparatus capable of treating waste gas discharged from a semiconductor process. The apparatus comprises the following components: a main body, which is provided with an inlet for waste gas and an outlet for gas; a partition wall, which is disposed in the body so as to divide the inlet and the outlet; anti-adhering part, which is arranged at the inlet for supplying hot nitrogen and water for the main body in order to prevent powder adhering the inlet, and evaporating water contained in the waste gas; a filtering part, which is arranged in the main body, in order to remove powder, dust, impurity, water-soluble gas and the like contained in the waste gas;</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language chi ; eng
recordid cdi_epo_espacenet_CN106861351A
source esp@cenet
subjects PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
SEPARATION
TRANSPORTING
title Pre-Treatment Apparatus For Waste Gas Treatment Apparatus
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-20T18%3A41%3A05IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=JEONG%20HOON&rft.date=2017-06-20&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN106861351A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true