Pre-Treatment Apparatus For Waste Gas Treatment Apparatus

The invention discloses a pre-treatment apparatus for a waste gas treatment apparatus. A pretreatment apparatus for a waste gas treatment apparatus is disclosed. The pretreatment apparatus for waste gas treatment according to an embodiment of the present invention is a pretreatment apparatus for a s...

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Hauptverfasser: JEONG HOON, KIM JIN UK, CHA YONG SUN, LEE KEUN SU
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention discloses a pre-treatment apparatus for a waste gas treatment apparatus. A pretreatment apparatus for a waste gas treatment apparatus is disclosed. The pretreatment apparatus for waste gas treatment according to an embodiment of the present invention is a pretreatment apparatus for a single body installed at the front end of a waste gas treatment apparatus capable of treating waste gas discharged from a semiconductor process. The apparatus comprises the following components: a main body, which is provided with an inlet for waste gas and an outlet for gas; a partition wall, which is disposed in the body so as to divide the inlet and the outlet; anti-adhering part, which is arranged at the inlet for supplying hot nitrogen and water for the main body in order to prevent powder adhering the inlet, and evaporating water contained in the waste gas; a filtering part, which is arranged in the main body, in order to remove powder, dust, impurity, water-soluble gas and the like contained in the waste gas;