Silicon material loading method

The invention discloses a silicon material loading method. The silicon material loading method comprises the steps: loading silicon material seed crystals to the bottom of a crucible; loading a plurality of layers of block-shaped materials with middle gaps to the upper parts of the silicon material...

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Bibliographische Detailangaben
Hauptverfasser: CHEN WEI, YAN WENYONG, LI LINDONG, LAI YIFENG, DENG QINGXIANG, CHEN ZHIJUN, JIN HAO, WANG QUANZHI, YE XINGFANG, XIAO GUIYUN
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention discloses a silicon material loading method. The silicon material loading method comprises the steps: loading silicon material seed crystals to the bottom of a crucible; loading a plurality of layers of block-shaped materials with middle gaps to the upper parts of the silicon material seed crystals; loading a layer of intensively arranged block-shaped materials to the upper part of the uppermost layer of block-shaped materials with the middle gaps; and loading the rest silicon materials to the upper parts of the intensively arranged block-shaped materials. The silicon material loading method disclosed by the invention has the advantage that the temperature of the bottom can be optimized on the premise of low cost, so that the seed crystal keeping area at the bottom is increased. 本申请公开了种硅料装料方法,包括:在坩埚底部装入硅料籽晶;在所述硅料籽晶的上部装入多层具有中间空隙的块状料;在最上面层具有中间空隙的块状料的上部装入层密排的块状料;在所述密排的块状料的上部装入剩余的硅料。本申请提供的上述硅料装料方法,能够在低成本的前提下,优化底部的温度,使得底部籽晶保留的面积增多。