Laminated substrate for epitaxial growth of nitride and forming method thereof
The invention provides a laminated substrate for epitaxial growth of nitride and a forming method thereof. The laminated substrate comprises at least one set of laminating structure, the laminating structure comprises a chromium nitride layer and an aluminum nitride layer, and the chromium nitride l...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention provides a laminated substrate for epitaxial growth of nitride and a forming method thereof. The laminated substrate comprises at least one set of laminating structure, the laminating structure comprises a chromium nitride layer and an aluminum nitride layer, and the chromium nitride layer and the aluminum nitride layer are mutually laminated; the laminated substrate has a hexagonal crystal structure. The laminated substrate is suitable for being adopted as a substrate as a high-temperature growth nitride epitaxial layer to form a nitride epitaxial layer with high quality.
种用于氮化物外延生长的叠层基板及其形成方法,所述叠层基板包括:至少组堆叠结构,所述堆叠结构包括氮化铪层和氮化铝层,所述氮化铪层和氮化铝层相互堆叠;所述叠层基板具有六方晶体结构。所述叠层基板适于作为高温生长氮化物外延层的基底,形成高质量的氮化物外延层。 |
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