Microwave plasma chemical vapor deposition diamond reaction device

The invention discloses a microwave plasma chemical vapor deposition diamond reaction device which comprises a resonator cavity, wherein the resonator cavity is composed of an upper cylindrical cavity, a middle arc cavity and a lower cylindrical cavity; the curvature radius of the middle arc cavity is equal to microwave wavelength; a reactive gas inlet is formed in a top cover of the upper cylindrical cavity, and a quartz clock cover medium window and a coaxial probe antenna are mounted on the top cover of the upper cylindrical cavity; an air inlet pipe and an air outlet hole are arranged on the coaxial probe antenna; a reflective plate and a cylindrical lifting base are arranged in the lower cylindrical cavity; a reactive gas outlet is formed in the reflective plate; and a total reactive gas outlet is formed in the bottom plate of the lower cylindrical cavity. The device disclosed by the invention has the advantages of high focusing capability, capacity of containing high input power, simple structure, conve