ETCHANT COMPOSITION, METHOD FOR ETCHING MULTILAYERED FILM, AND METHOD FOR PREPARING DISPLAY DEVICE

Disclosed are: an etchant composition comprising (A) a copper ion source, (B) a source of an organic acid ion having one or more carboxyl groups in a molecule, (C) a fluoride ion source, (D) an etching controller, a surface oxidizing power enhancer or a combination thereof as a first additive, and (...

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Bibliographische Detailangaben
Hauptverfasser:	MANRIQUEZ JAVIER, ACHTNER GERFRIED R, HALL THOMAS D, MAHN RYAN M, ACHTNER
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	Disclosed are: an etchant composition comprising (A) a copper ion source, (B) a source of an organic acid ion having one or more carboxyl groups in a molecule, (C) a fluoride ion source, (D) an etching controller, a surface oxidizing power enhancer or a combination thereof as a first additive, and (E) a surfactant as a second additive; a method for etching a multilayered film; and a method for preparing a display device. 本发明涉及种蚀刻液组合物、多层膜的蚀刻方法、和显示装置的制造方法，其中，本发明的蚀刻液组合物包含：(A)铜离子供给源；(B)分子内具有1个以上的羧基的有机酸离子供给源；(C)氟离子供给源；(D)作为第添加剂的蚀刻调节剂、表面氧化力提高剂、或者这些的组合；以及(E)作为第二添加剂的表面活性剂。