Photoresist and application method thereof

The invention provides a photoresist and an application method thereof. The photoresist is genetic recombinant spider silk protein. Compared with a conventional photoresist, the genetic recombinant spider silk protein serving as the photoresist has a series of outstanding advantages of being good in biocompatibility, excellent in mechanical performance, good in etching-resistant selectivity, easy in functionalization and controllable in degradation, and the like. According to the photoresist provided by the invention, in a use process, only water is used as a solvent and a developing solution; the compatibility and the environmental friendliness of a processing technique are furthest guaranteed; in addition, through changing the cross-linking extent of the genetic recombinant spider silk protein; positive and negative dual purposes, that is, the genetic recombinant spider silk protein not only can be used as a positive photoresist but also can be used as a negative photoresist, can be realized; by associating