Illumination system

An illumination system (IL) for a lithographic apparatus comprises an array of lenses (2a-h) configured to receive a beam of radiation (B) and focus the beam of radiation into a plurality of sub-beams (4a-h), an array of reflective elements (6a-h) configured to receive the sub-beams and reflect the...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	GODFRIED HERMAN PHILIP, OP'T ROOT WILHELMUS PATRICK ELISABETH MARIA, VAN BUSSEL HUBERTUS PETRUS LEONARDUS HENRICA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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