Illumination system

An illumination system (IL) for a lithographic apparatus comprises an array of lenses (2a-h) configured to receive a beam of radiation (B) and focus the beam of radiation into a plurality of sub-beams (4a-h), an array of reflective elements (6a-h) configured to receive the sub-beams and reflect the...

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Bibliographische Detailangaben
Hauptverfasser:	GODFRIED HERMAN PHILIP, OP'T ROOT WILHELMUS PATRICK ELISABETH MARIA, VAN BUSSEL HUBERTUS PETRUS LEONARDUS HENRICA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	An illumination system (IL) for a lithographic apparatus comprises an array of lenses (2a-h) configured to receive a beam of radiation (B) and focus the beam of radiation into a plurality of sub-beams (4a-h), an array of reflective elements (6a-h) configured to receive the sub-beams and reflect the sub-beams so as to form an illumination beam (8), a beam splitting device (10) configured to split the illumination beam into a first portion (12) and a second portion (14) wherein the first portion is directed to be incident on a lithographic patterning device (MA), a focusing unit (22) configured to focus the second portion of the illumination beam onto a detection plane such that an image is formed at the detection plane and wherein the image is an image of the sub-beams in which the sub-beams do not overlap with each other and an array of detector elements (24) configured to measure the intensity of radiation which is incident on the detection plane. 种用于光刻设备的照射系统(IL)包括：透镜阵列(2a-h)，被配置成接收辐射束(B)且将所述辐射束聚焦成多个子束(4a-h