Lithography apparatus and method of manufacturing a device

An immersion lithography apparatus has a controller (500) configured to control a substrate table (WT) to move along an exposure route including in order: an entry motion (R2) in which the substrate moves from an off-substrate position at which the immersion space (10) does not overlap the substrate (W) to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion (R3, R4) in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned bean is not projected onto the substrate during the entry motion and the transfer motion. 种浸没式光刻设备具有控制器(500)，所述控制器(500)被配置用以控制衬底台(WT)沿着曝光路线移动，所述曝光路线按次序包括：进入运动(R2)，其中衬底从浸没空间(10)不与所述衬底重叠的衬底外位置移动至所述浸没空间