Electrodeposition mediums for formation of protective coatings electrochemically deposited on metal substrates

Articles including a conductive metal substrate and a protective coating on the metal substrate are provided. The protective coating is electro chemically deposited from an electrodeposition medium including a silicon alkoxide and quaternary ammonium compounds or quaternary phosphonium compounds. Me...

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Bibliographische Detailangaben
Hauptverfasser:	RANGANATHAN SATHISH KUMAR, JADHAV SAMEER SHANKAR, SAWANT VITTHAL ABASO, DAVIS CODY R, ANDERSEN RYAN M, SIRIPURAPU SRINIVAS, MHETAR VIJAY, MALSHE VINOD CHINTAMANI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS THEREFOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS CABLES CHEMISTRY CONDUCTORS ELECTRICITY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES INSULATORS METALLURGY PERFORMING OPERATIONS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	Articles including a conductive metal substrate and a protective coating on the metal substrate are provided. The protective coating is electro chemically deposited from an electrodeposition medium including a silicon alkoxide and quaternary ammonium compounds or quaternary phosphonium compounds. Methods of electro chemically depositing such protective coatings are also described herein. 提供包括导电性金属基底和在该金属基底上的保护性涂层的制品。该保护性涂层是由包含硅的烷氧化物和季铵化合物或季化合物的电沉积介质电化学沉积的。本文还描述了电化学沉积这样的保护性涂层的方法。