Powder-particle-vibrating magnetron sputtering coating method

The invention discloses a powder-particle-vibrating magnetron sputtering coating method. A layer of metal or alloy film is formed on the surface of a vibrating powder particle through magnetron sputtering by using a physical vapor deposition (PVD) method. The powder-particle- vibrating magnetron spu...

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Bibliographische Detailangaben
Hauptverfasser: GAO XUEXU, BAO XIAOQIAN, CAO SHUAI, LI JIHENG, MA BIN, LU KECHAO
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention discloses a powder-particle-vibrating magnetron sputtering coating method. A layer of metal or alloy film is formed on the surface of a vibrating powder particle through magnetron sputtering by using a physical vapor deposition (PVD) method. The powder-particle- vibrating magnetron sputtering coating method comprises the main steps as follows: 1) connecting a feeding tank filled with power particles and a feeding hole of magnetron sputtering equipment in a sealing way, and mounting metal targets on target positions; 2) carrying out vacuumization to 4*10Pa; 3) introducing argon, and controlling the pressure of argon to be maintained at 0.1-0.5Pa; 4) setting the sputtering power of unit target area to be 5-10w/cm and carrying out sputtering cleaning on the targets for 10-15min; 5) setting the output power of a motor to enable the powder particles to vibrate in a vibrating trough according to a certain speed to pass through a sputtering region; and 6) after finishing sputtering coating, filling