Fluorine-containing conductive films

An atomic layer deposition (ALD) process for depositing a fluorine-containing thin film on a substrate can include a plurality of super-cycles. Each super-cycle may include a metal fluoride sub-cycle and a reducing sub-cycle. The metal fluoride sub-cycle may include contacting the substrate with a metal fluoride. The reducing sub-cycle may include alternately and sequentially contacting the substrate with a reducing agent and a nitrogen reactant. 用于在基底上沉积含氟薄膜的原子层沉积(ALD)方法可以包括多个超循环。每个超循环可以包括金属氟化物子循环和还原子循环。金属氟化物子循环可以包括使基底与金属氟化物接触。还原子循环可以包括交替地和连续地使基底与还原剂和氮反应物接触。