COMPOSITION FOR FORMING SILICA LAYER, METHOD FOR MANUFACTURING SILICA LAYER, SILICA LAYER AND ELECTRONIC DEVICE

The invention provides a composition for forming a silica layer, a method for manufacturing the silica layer, the silica layer and an electronic device. A composition for forming a silica layer includes a silicon-containing polymer and a mixed solvent including at least two solvents, wherein the mix...

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Hauptverfasser:	SEO, JINWOO, KIM, JINGYO, LEE, EUNSEON, NA, YOONG HEE, JANG, JUNYOUNG, YUN, HUICHAN, KWAK, TAEKSOO, BAE, JIN-HEE, KIM, HANEUL, HWANG, BYEONGGYU, NOH, KUNBAE, KIM, WOO HAN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FREQUENCY-CHANGING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	The invention provides a composition for forming a silica layer, a method for manufacturing the silica layer, the silica layer and an electronic device. A composition for forming a silica layer includes a silicon-containing polymer and a mixed solvent including at least two solvents, wherein the mixed solvent has a surface tension of about 5 mN/m to about 35 mN/m at a temperature of about 25 DEG C. 本发明提供种用于形成氧化硅层的组合物、制造氧化硅层的方法、氧化硅层及电子装置。用于形成氧化硅层的组合物包含含硅聚合物和包含至少两种溶剂的混合溶剂，其中所述混合溶剂在25℃下的表面张力是5毫牛/米至35毫牛/米。本发明的用于形成氧化硅层的组合物能够提供具有小缺陷和均厚度的氧化硅层。