Method and apparatus for repairing film
The present invention relates to a method for repairing a film, which comprises a process of confirming defects on a thin film, a process of removing a defective area of the thin film to a size which is inputted into a predetermined removal setting value, a process of supplying a repairing material...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The present invention relates to a method for repairing a film, which comprises a process of confirming defects on a thin film, a process of removing a defective area of the thin film to a size which is inputted into a predetermined removal setting value, a process of supplying a repairing material to the removed area, and a process of drying or curing the repairing material. Therefore, it is possible to prevent over-discharge or under-discharge of the repairing material and improve the efficiency of repair processes.
本发明涉及修复方法及修复装置,其中所述修复方法包括如下步骤:确认薄膜上的缺陷的过程;以提前设定的去除设定值中所输入的大小,去除所述薄膜的出现所述缺陷的区域的过程;向所述被去除的部分供应修复物质的过程;及干燥或硬化所述修复物质的过程。进而,本发明修复方法能够防止修复物质过多排放或过少排放,并且提高修复工艺的效率。 |
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