Silicon wafer processing cleaning effluent resource recycling method

The invention provides a silicon wafer processing cleaning effluent resource recycling method, which comprises the following steps of (1)fluoro-silicifying: adding silica flour in a silicon wafer processing cleaning effluent, reacting, and then filter pressing to obtain first filter liquor and first...

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Bibliographische Detailangaben
Hauptverfasser: ZHAO ZHI'AN, YI FEIHONG
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention provides a silicon wafer processing cleaning effluent resource recycling method, which comprises the following steps of (1)fluoro-silicifying: adding silica flour in a silicon wafer processing cleaning effluent, reacting, and then filter pressing to obtain first filter liquor and first filter residue; (2) defluorinating: adding sodium sulfate/ potassium sulfate into the first filter liquor obtained through the step (1), reacting, and then filter pressing to obtain second filter liquor and second filter residue, wherein the second filter residue is sodium fluosilicate/potassium fluosilicate; (3) carrying out reduced pressure distillation on the second filter liquor obtained through the step (2) to obtain nitric acid and distillation mother liquid, and cooling and filter pressing the distillation mother liquid to obtain third filter liquor and third filter residue, wherein the third filter liquor is dilute sulphuric acid, and the third filter residue is sodium sulfate/potassium sulphate. According