Method for forming a pattern

A method for forming a pattern comprises the steps of: forming a patterned core layer on a substrate, conformally forming a spacer layer on the patterned core layer and the substrate to form a plurality of first concave portions surrounded by the spacer layer, performing an etch back process to expo...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	WANG YAIH, SHIH CHIANG-LIN, HSU SHU-HAO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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