Method for forming a pattern

A method for forming a pattern comprises the steps of: forming a patterned core layer on a substrate, conformally forming a spacer layer on the patterned core layer and the substrate to form a plurality of first concave portions surrounded by the spacer layer, performing an etch back process to expose the patterned core layer and the substrate under the concave portions, removing the exposed patterned core layer to form a plurality of second concave portions surrounded by the spacer layer, filling up the first concave portions and the second concave portions with a directed self-assembly material; and activating a directed self-assembly process so that the directed self-assembly material filling up the first concave portions and the second concave portions diffuse to the boundaries of the first concave portions and the second concave portions to form a hole surrounding by the directed self-assembly material in each of the first concave portions and the second concave portions. 本发明公开了种形成图案的方法。首先,在衬底上形成图案化核心层。接