Method for improving accuracy in modulating width of crystallizer
The invention relates to the control field of taper and width of a crystallizer, in particular to a method for improving the accuracy in modulating the width of the crystallizer. The method comprises the steps of obtaining current horizontal lengths from central points of an upper rotary shaft and a...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention relates to the control field of taper and width of a crystallizer, in particular to a method for improving the accuracy in modulating the width of the crystallizer. The method comprises the steps of obtaining current horizontal lengths from central points of an upper rotary shaft and a lower rotary shaft to a narrow-face crystallizer copper plate through an algorithm by utilizing a current absolute taper Bi of the narrow-face crystallizer copper plate , lengths La from the central points of the upper rotary shaft and the lower rotary shaft to the narrow-face crystallizer copper plate, and vertical projection lengths Lt (Lb) from the central points of the upper rotary shaft and the lower rotary shaft to the top end (the bottom end) of the narrow-face crystallizer copper plate, and compensating into position setting values of the central points of the upper rotary shaft and the lower rotary shaft. According to the method for improving the accuracy in modulating the width of the crystallizer provid |
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