Lithography apparatus, and article manufacturing method

Provided is a lithography apparatus that performs a patterning on a substrate. The lithography apparatus includes a processor configured to perform processing of assigning, to each of a plurality of substrates sequentially carried in from a first external apparatus, order information indicating an carrying-in order of the plurality of substrates; a plurality of units configured to respectively perform patternings of the plurality of substrates in parallel; and a transmitting device configured to transmit, to a second external apparatus, the order information corresponding to a substrate, of the plurality of substrates, carried out after being patterned thereon by one of the plurality of units. 提供了在基板上执行构图的光刻装置。光刻装置包括：被配置为执行向从第外部装置顺序送入的多个基板中每个指派指示出多个基板的送入次序的次序信息的处理的处理器；被配置为并行地分别执行多个基板的构图的多个单元；以及被配置为向第二外部装置发送与多个基板中的由多个单元中的个单元在其上构图之后被送出的基板对应的次序信息的发送设备。