Mark, display apparatus, and method for monitoring exposure and etching process stability by use of mark

The invention provides a mark used for monitoring exposure and etching process stability, a display apparatus provided with the mark, and a method for monitoring exposure and etching process stability by use of the mark. The mark comprises a plurality of metal mark lines with bending parts; the plurality of metal mark lines are arranged at intervals in parallel, wherein the interval between two adjacent metal mark lines with the smallest interval is smaller than a resolution limit of the exposure process; the interval between two adjacent metal mark lines with the largest interval is greater than a photomask design value, wherein the interval between at least one pair of adjacent metal mark lines among the plurality of metal mark lines is equal to the interval between two adjacent metal wires in a to-be-etched region. 本发明提供了种用于监控曝光和蚀刻制程稳定性的标记、种设置有该标记的显示装置以及种利用上述标记监控曝光和蚀刻制程稳定性的方法。所述标记包括多条具有弯曲部的金属标识线，所述多条金属标识线相互间隔且平行设置，其中，间距最小的两条相邻的金属标识线之间的间距小于曝光制程的分辨率极限，间距最大的两相邻所述金属标识线之间的间距大于光罩设计值，其中，所述多条金属标识线中的至少对相邻的金属标识线之间的间