Post-CMP washiing liquid composition

The present invention relates to a composition for a post-CMP cleaning solution comprising: 0.01-10 wt% of 2-Amino-2-methyl-1-propanol; 0.1-10 wt% of quaternary ammonium hydroxide; 0.001-3 wt% of a chelation agent; 0.001-5 wt% of piperazine; and the remainder consisting of ultrapure water so that th...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SONG, JUNG HWAN, HAN, NA, KIM, BYEOUNG TAK, LIM, AH HYEON, JO, SUNG IL, JEON, SEONG SIK, LEE, SOK HO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICALMETHODS OTHER THAN ELECTROLYSIS COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY
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