LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

A lithographic apparatus comprising a reflector (15) to redirect a radiation beam e.g. an EUV beam. The position of the reflector is controlled using a controller and a positioning system. The positioning system comprises a non-compensating actuator device (300) and a compensating actuator device (2...

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Bibliographische Detailangaben
Hauptverfasser:	DE JONGH ROBERTUS JOHANNES MARINUS, MERKX LEON LEONARDUS FRANCISCUS, MERRY ROEL JOHANNES ELISABETH
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A lithographic apparatus comprising a reflector (15) to redirect a radiation beam e.g. an EUV beam. The position of the reflector is controlled using a controller and a positioning system. The positioning system comprises a non-compensating actuator device (300) and a compensating actuator device (200) to compensate for parasitic forces of the non-compensating actuator device. The positioning system and controller can provide a more accurate position of the reflector, reduce deformation of the reflector and reduce the magnitude of forces transmitting through the reflector. 种光刻设备，包括用于重定向辐射束例如EUV束的反射器(15)。使用控制器和定位系统控制反射器的位置。定位系统包括非补偿致动器装置(300)和用于补偿非补偿致动器装置的寄生力的补偿致动器装置(200)。定位系统和控制器可以提供反射器的更精确位置，减小反射器的变形以及减小穿过反射器传播的力的幅度。