Substrate carrier that carries a substrate on each of two broad sides of the substrate carrier that face away from each other
The invention discloses a substrate carrier that carries a substrate on each of two broad sides of the substrate carrier that face away from each other. The invention relates to a substrate carrier and to a CVD reactor interacting with the substrate carrier, said substrate carrier being designed to...
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| creator | RIPPINGTON DAVID ERIC JOUVRAY ALEXANDRE RUPESINGHE NALIN L TEO KENNETH B K |
| description | The invention discloses a substrate carrier that carries a substrate on each of two broad sides of the substrate carrier that face away from each other. The invention relates to a substrate carrier and to a CVD reactor interacting with the substrate carrier, said substrate carrier being designed to be arranged in a CVD or PVD reactor (20), in particular for the deposition of carbon nanotubes or graphene, said substrate carrier having a first broad-side surface (2) for accommodating a substrate (6) to be coated and a second broad-side surface (3) facing away from the first broad-side surface (2). In order to improve a device or parts of a device for depositing carbon nanotubes, the first broad-side surface (2) and the second broad-side surface (3) according to the invention each have a substrate accommodation zone (4, 5), in which fastening elements (14, 14', 15) are provided, by means of which a substrate (6) or sections of a substrate (6) can be fastened to the broad-side surface (2, 3). The invention furthe |
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The invention relates to a substrate carrier and to a CVD reactor interacting with the substrate carrier, said substrate carrier being designed to be arranged in a CVD or PVD reactor (20), in particular for the deposition of carbon nanotubes or graphene, said substrate carrier having a first broad-side surface (2) for accommodating a substrate (6) to be coated and a second broad-side surface (3) facing away from the first broad-side surface (2). In order to improve a device or parts of a device for depositing carbon nanotubes, the first broad-side surface (2) and the second broad-side surface (3) according to the invention each have a substrate accommodation zone (4, 5), in which fastening elements (14, 14', 15) are provided, by means of which a substrate (6) or sections of a substrate (6) can be fastened to the broad-side surface (2, 3). The invention furthe</description><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SEMICONDUCTOR DEVICES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20161116&DB=EPODOC&CC=CN&NR=106133187A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20161116&DB=EPODOC&CC=CN&NR=106133187A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>RIPPINGTON DAVID ERIC</creatorcontrib><creatorcontrib>JOUVRAY ALEXANDRE</creatorcontrib><creatorcontrib>RUPESINGHE NALIN L</creatorcontrib><creatorcontrib>TEO KENNETH B K</creatorcontrib><title>Substrate carrier that carries a substrate on each of two broad sides of the substrate carrier that face away from each other</title><description>The invention discloses a substrate carrier that carries a substrate on each of two broad sides of the substrate carrier that face away from each other. The invention relates to a substrate carrier and to a CVD reactor interacting with the substrate carrier, said substrate carrier being designed to be arranged in a CVD or PVD reactor (20), in particular for the deposition of carbon nanotubes or graphene, said substrate carrier having a first broad-side surface (2) for accommodating a substrate (6) to be coated and a second broad-side surface (3) facing away from the first broad-side surface (2). In order to improve a device or parts of a device for depositing carbon nanotubes, the first broad-side surface (2) and the second broad-side surface (3) according to the invention each have a substrate accommodation zone (4, 5), in which fastening elements (14, 14', 15) are provided, by means of which a substrate (6) or sections of a substrate (6) can be fastened to the broad-side surface (2, 3). 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| language | chi ; eng |
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| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | Substrate carrier that carries a substrate on each of two broad sides of the substrate carrier that face away from each other |
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