Substrate carrier that carries a substrate on each of two broad sides of the substrate carrier that face away from each other

The invention discloses a substrate carrier that carries a substrate on each of two broad sides of the substrate carrier that face away from each other. The invention relates to a substrate carrier and to a CVD reactor interacting with the substrate carrier, said substrate carrier being designed to be arranged in a CVD or PVD reactor (20), in particular for the deposition of carbon nanotubes or graphene, said substrate carrier having a first broad-side surface (2) for accommodating a substrate (6) to be coated and a second broad-side surface (3) facing away from the first broad-side surface (2). In order to improve a device or parts of a device for depositing carbon nanotubes, the first broad-side surface (2) and the second broad-side surface (3) according to the invention each have a substrate accommodation zone (4, 5), in which fastening elements (14, 14', 15) are provided, by means of which a substrate (6) or sections of a substrate (6) can be fastened to the broad-side surface (2, 3). The invention furthe