Day and night dual-purpose division element photographic manufacturing method

Day and night dual-purpose division element photographic manufacturing method

The invention discloses a day and night dual-purpose division element photographic manufacturing method. The method comprises the steps that S1, BN303 negative photoresist is evenly coated on the surface of an optical blank by a rotating-speed-adjustable centrifugal gumming machine by controlling ro...

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Hauptverfasser: REN YUHE, CHENG PING, GONG TAO, LIU HAIWEI, TIAN JUN, ZHANG CHENGQUN, SU YING, CHEN JUYI, ZHANG YONG, BAI TAO, CHEN DUNXIA
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Sprache:chi ; eng
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OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
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creator REN YUHE
CHENG PING
GONG TAO
LIU HAIWEI
TIAN JUN
ZHANG CHENGQUN
SU YING
CHEN JUYI
ZHANG YONG
BAI TAO
CHEN DUNXIA
description The invention discloses a day and night dual-purpose division element photographic manufacturing method. The method comprises the steps that S1, BN303 negative photoresist is evenly coated on the surface of an optical blank by a rotating-speed-adjustable centrifugal gumming machine by controlling rotating speed at 3000r/min-4000r/min after manufacturing of the optical blank is qualified, and prebake drying is performed; S2, the precision of a photoplate is detected to meet the requirements, the surface coated by the photoresist layer downwardly faces the photoplate for contact exposure and exposure time is 120s-150s; S3, protective wax is coated on the side surface of a component through developing, rinsing, inspection and postbake drying; S4, a glass etching solution is prepared according to the proportion of 20%-25% of hydrofluoric acid, 35%-40% of sulfuric acid and 40% of phosphoric acid; and S5, the component is immersed in the glass etching solution for 8s-15s and taken out and then rinsed by clear water
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subjects OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
title Day and night dual-purpose division element photographic manufacturing method
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