Day and night dual-purpose division element photographic manufacturing method
The invention discloses a day and night dual-purpose division element photographic manufacturing method. The method comprises the steps that S1, BN303 negative photoresist is evenly coated on the surface of an optical blank by a rotating-speed-adjustable centrifugal gumming machine by controlling ro...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses a day and night dual-purpose division element photographic manufacturing method. The method comprises the steps that S1, BN303 negative photoresist is evenly coated on the surface of an optical blank by a rotating-speed-adjustable centrifugal gumming machine by controlling rotating speed at 3000r/min-4000r/min after manufacturing of the optical blank is qualified, and prebake drying is performed; S2, the precision of a photoplate is detected to meet the requirements, the surface coated by the photoresist layer downwardly faces the photoplate for contact exposure and exposure time is 120s-150s; S3, protective wax is coated on the side surface of a component through developing, rinsing, inspection and postbake drying; S4, a glass etching solution is prepared according to the proportion of 20%-25% of hydrofluoric acid, 35%-40% of sulfuric acid and 40% of phosphoric acid; and S5, the component is immersed in the glass etching solution for 8s-15s and taken out and then rinsed by clear water |
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