Method for manufacturing solar cell and solar cell

This invention is characterized by including: a step for forming an n-type silicon substrate (1) having a p-n junction, and forming a p-type diffusion layer (2) on one main surface side of the n-type silicon substrate (1); a step for forming a layered film of a silicon oxide film (5) and a silicon n...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: SHIRAYANAGI YUSUKE, YAMARIN HIROYA
Format: Patent
Sprache:chi ; eng
Schlagworte:
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