Organic metal compound-containing gas supply device
[Problem] To provide an organic metal compound supply device that can stably supply an organic metal compound-containing gas stably over a long period of time. [Solution] This supply device (1) of an organic metal compound-containing gas is provided with a container (10), a supply unit (13), and a h...
Gespeichert in:
| Hauptverfasser: | , , , |
|---|---|
| Format: | Patent |
| Sprache: | chi ; eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | HASEGAWA CHIHIRO YOSHITOMI SUSUMU TAKEBAYASHI KOUJI SHIRAI MASASHI |
| description | [Problem] To provide an organic metal compound supply device that can stably supply an organic metal compound-containing gas stably over a long period of time. [Solution] This supply device (1) of an organic metal compound-containing gas is provided with a container (10), a supply unit (13), and a high-specific gravity object. The container (10) comprises an inner space (10a), a carrier gas inlet (10b) and an exhaust port (10c). The inlet (10b) is connected to the bottom of the inner space (10a). The exhaust port (10c) is connected to the top of the inner space (10a). The supply unit (13) is positioned in the inner space (10a). A mixture of organic metal compound-containing particles and a filler material is arranged in the supply unit (13). The high-specific gravity object is arranged in the inner space (10a), above the supply unit (13). The high-specific gravity object has a specific gravity higher than that of the organic metal compound-containing particles.
本发明提供种能够长时间稳定地供给含有机金属化合物的气体的有机金属化合物的供给装置。含有机金属化合 |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN106062244A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN106062244A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN106062244A3</originalsourceid><addsrcrecordid>eNrjZDD2L0pPzMtMVshNLUnMUUjOzy3IL81L0U3OzytJzMzLzEtXSE8sViguLSjIqVRISS3LTE7lYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxzn6GBmYGZkZGJiaOxsSoAQAUkyyW</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Organic metal compound-containing gas supply device</title><source>esp@cenet</source><creator>HASEGAWA CHIHIRO ; YOSHITOMI SUSUMU ; TAKEBAYASHI KOUJI ; SHIRAI MASASHI</creator><creatorcontrib>HASEGAWA CHIHIRO ; YOSHITOMI SUSUMU ; TAKEBAYASHI KOUJI ; SHIRAI MASASHI</creatorcontrib><description>[Problem] To provide an organic metal compound supply device that can stably supply an organic metal compound-containing gas stably over a long period of time. [Solution] This supply device (1) of an organic metal compound-containing gas is provided with a container (10), a supply unit (13), and a high-specific gravity object. The container (10) comprises an inner space (10a), a carrier gas inlet (10b) and an exhaust port (10c). The inlet (10b) is connected to the bottom of the inner space (10a). The exhaust port (10c) is connected to the top of the inner space (10a). The supply unit (13) is positioned in the inner space (10a). A mixture of organic metal compound-containing particles and a filler material is arranged in the supply unit (13). The high-specific gravity object is arranged in the inner space (10a), above the supply unit (13). The high-specific gravity object has a specific gravity higher than that of the organic metal compound-containing particles.
本发明提供种能够长时间稳定地供给含有机金属化合物的气体的有机金属化合物的供给装置。含有机金属化合</description><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SEMICONDUCTOR DEVICES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20161026&DB=EPODOC&CC=CN&NR=106062244A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25544,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20161026&DB=EPODOC&CC=CN&NR=106062244A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HASEGAWA CHIHIRO</creatorcontrib><creatorcontrib>YOSHITOMI SUSUMU</creatorcontrib><creatorcontrib>TAKEBAYASHI KOUJI</creatorcontrib><creatorcontrib>SHIRAI MASASHI</creatorcontrib><title>Organic metal compound-containing gas supply device</title><description>[Problem] To provide an organic metal compound supply device that can stably supply an organic metal compound-containing gas stably over a long period of time. [Solution] This supply device (1) of an organic metal compound-containing gas is provided with a container (10), a supply unit (13), and a high-specific gravity object. The container (10) comprises an inner space (10a), a carrier gas inlet (10b) and an exhaust port (10c). The inlet (10b) is connected to the bottom of the inner space (10a). The exhaust port (10c) is connected to the top of the inner space (10a). The supply unit (13) is positioned in the inner space (10a). A mixture of organic metal compound-containing particles and a filler material is arranged in the supply unit (13). The high-specific gravity object is arranged in the inner space (10a), above the supply unit (13). The high-specific gravity object has a specific gravity higher than that of the organic metal compound-containing particles.
本发明提供种能够长时间稳定地供给含有机金属化合物的气体的有机金属化合物的供给装置。含有机金属化合</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2016</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDD2L0pPzMtMVshNLUnMUUjOzy3IL81L0U3OzytJzMzLzEtXSE8sViguLSjIqVRISS3LTE7lYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxzn6GBmYGZkZGJiaOxsSoAQAUkyyW</recordid><startdate>20161026</startdate><enddate>20161026</enddate><creator>HASEGAWA CHIHIRO</creator><creator>YOSHITOMI SUSUMU</creator><creator>TAKEBAYASHI KOUJI</creator><creator>SHIRAI MASASHI</creator><scope>EVB</scope></search><sort><creationdate>20161026</creationdate><title>Organic metal compound-containing gas supply device</title><author>HASEGAWA CHIHIRO ; YOSHITOMI SUSUMU ; TAKEBAYASHI KOUJI ; SHIRAI MASASHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN106062244A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2016</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>HASEGAWA CHIHIRO</creatorcontrib><creatorcontrib>YOSHITOMI SUSUMU</creatorcontrib><creatorcontrib>TAKEBAYASHI KOUJI</creatorcontrib><creatorcontrib>SHIRAI MASASHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HASEGAWA CHIHIRO</au><au>YOSHITOMI SUSUMU</au><au>TAKEBAYASHI KOUJI</au><au>SHIRAI MASASHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Organic metal compound-containing gas supply device</title><date>2016-10-26</date><risdate>2016</risdate><abstract>[Problem] To provide an organic metal compound supply device that can stably supply an organic metal compound-containing gas stably over a long period of time. [Solution] This supply device (1) of an organic metal compound-containing gas is provided with a container (10), a supply unit (13), and a high-specific gravity object. The container (10) comprises an inner space (10a), a carrier gas inlet (10b) and an exhaust port (10c). The inlet (10b) is connected to the bottom of the inner space (10a). The exhaust port (10c) is connected to the top of the inner space (10a). The supply unit (13) is positioned in the inner space (10a). A mixture of organic metal compound-containing particles and a filler material is arranged in the supply unit (13). The high-specific gravity object is arranged in the inner space (10a), above the supply unit (13). The high-specific gravity object has a specific gravity higher than that of the organic metal compound-containing particles.
本发明提供种能够长时间稳定地供给含有机金属化合物的气体的有机金属化合物的供给装置。含有机金属化合</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | chi ; eng |
| recordid | cdi_epo_espacenet_CN106062244A |
| source | esp@cenet |
| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | Organic metal compound-containing gas supply device |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-27T21%3A25%3A09IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=HASEGAWA%20CHIHIRO&rft.date=2016-10-26&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN106062244A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |