Method Of Manufacturing Semiconductor Device

The present invention aims to provide a method of manufacturing a semiconductor device to thereby provide the semiconductor device with improved reliability. After formation of a first insulating film for an interlayer insulating film by spin coating, the surface of the first insulating film is subj...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	FUKAYA KAZUHIDE, HANAWA TOSHIKAZU
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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