Molecular beam enhanced GCIB treatment
A method and system for performing gas cluster ion beam (GCIB) etch processing of various materials is described. In particular, the GCIB etch processing includes using one or more molecular beams to optimize pressure at localized regions of the ion beam. 描述了种用于执行各种材料的气体团簇离子束(GCIB)蚀刻处理的方法和系统。特别地，该GC...
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| Format: | Patent |
| Sprache: | chi ; eng |
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| Zusammenfassung: | A method and system for performing gas cluster ion beam (GCIB) etch processing of various materials is described. In particular, the GCIB etch processing includes using one or more molecular beams to optimize pressure at localized regions of the ion beam.
描述了种用于执行各种材料的气体团簇离子束(GCIB)蚀刻处理的方法和系统。特别地，该GCIB蚀刻处理包括使用种或更多种分子束来优化离子束的局部区域处的压力。 |
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