Large-area static focusing and leveling device for mask aligner and method thereof

The invention puts forwards an efficient large-area static focusing and leveling device for a mask aligner. The device comprises a projection lens, a silicon wafer, a workbench and a focusing and leveling device. The projection lens exposes a mask pattern onto the silicon wafer. The focusing and lev...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Qi Jingchao, Chen Feibiao
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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