Large-area static focusing and leveling device for mask aligner and method thereof

The invention puts forwards an efficient large-area static focusing and leveling device for a mask aligner. The device comprises a projection lens, a silicon wafer, a workbench and a focusing and leveling device. The projection lens exposes a mask pattern onto the silicon wafer. The focusing and leveling device comprises a light source, an illuminating lens group, a projection slit, a protection lens group, a detection lens group and a detector. The light source passes through the illuminating lens group and the projection lens group to image the projection slit onto a detected object; and after reflected by the detected object, an image of the projection slit is imaged onto the detector through the detection lens group. The device is characterized in that a measurement optical spot of the projection slit can cover multiple exposure fields and each exposure field comprises multiple measurement optical spots. According to the efficient large-area static focusing and leveling device and the method thereof, mult