Method for preparing two-dimensional photonic crystal based on air column laser etching

The invention discloses a method for preparing a two-dimensional photonic crystal based on air column laser etching and belongs to the photonic crystal preparation technical field. According to the method, the difference of reflected colors is adjusted mainly through controlling the thickness of a film, the diameter and gaps of holes; a chromium (Cr) layer and a silicon oxide (SiOx) layer are deposited on a silicon (Si) substrate through adopting a magnetron sputtering method, and at the silicon oxide (SiOx) layer, air columns are etched through adopting a laser etching method, so that the two-dimensional photonic crystal can be prepared; and the diameter and gaps of the holes are adjusted through laser energy. The two-dimensional photonic crystal prepared through adopting the method of the invention can be applied to the optical anti-counterfeiting field. 本发明公开了种基于激光刻蚀空气柱二维光子晶体的制备方法，属制备光子晶体技术领域。本发明主要通过控制膜的厚度、孔径大小和孔间隙，来调节反射的颜色的不同。本发明是通过磁控溅射的方法在硅（Si）衬底上沉积铬（Cr）层和氧化硅（SiOx）层，然后在氧化硅（SiOx）层通过激光刻蚀的方法刻蚀空气柱来制备二维光子晶体。通