Device for supplying gasification agent to a low-temperature gasifier

The invention relates to a device for supplying gasification agent to a reactor (10) of a low-temperature gasifier (200, 300), wherein the device comprises at least one nozzle block (50, 60) joined at a first end (50a, 60a) by a pipe connection (51, 61) in a wall of the reactor (10) to a manifold (5...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Mihm Andreas, Halang Sven, Meusel Ronald, Suchy Tomas, Buschmann Jens
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention relates to a device for supplying gasification agent to a reactor (10) of a low-temperature gasifier (200, 300), wherein the device comprises at least one nozzle block (50, 60) joined at a first end (50a, 60a) by a pipe connection (51, 61) in a wall of the reactor (10) to a manifold (52, 62); the at least one nozzle block (50, 60) being located inside the reactor (10), and the manifold (52, 62) being located outside the reactor (10), the device being characterised in that the at least one nozzle block (50, 60) comprises at least two nozzle openings (55, 65). 本发明涉及种用于将气化剂注入低温气化器(200、300)的反应器(10)的装置,其中所述装置包括至少个喷嘴组件(50、60),所述至少个喷嘴组件在第末端(50a、60a)处通过位于反应器(10)的壁中的管连接(51、61)连接至歧管(52、62);所述至少个喷嘴组件(50、60)位于反应器(10)内部,并且歧管(52、62)位于反应器(10)外部,所述装置的特征在于,所述至少个喷嘴组件(50、60)包括至少两个喷嘴开口(55、65)。