Silsesquioxane having hot melt extrusion forming capability, highly transparent and highly heat-resistant plastic transparent substrate using same, and method of manufacturing same

The present invention relates to silsesquioxane having hot melt extrusion forming capability, a highly transparent and highly heat-resistant plastic transparent substrate using same, and a method of manufacturing same and, more particularly, to a plastic transparent substrate capable of being formed...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Kim Doo Shik, Choi Ji Sik, Oh Seong Yeon, Yoo Jae Won, Choi Seung Sock
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The present invention relates to silsesquioxane having hot melt extrusion forming capability, a highly transparent and highly heat-resistant plastic transparent substrate using same, and a method of manufacturing same and, more particularly, to a plastic transparent substrate capable of being formed through hot melt extrusion which is produced by sequentially hardening thermoplastic ladder-type silsesquioxane (having hot melt extrusion capability) through low-temperature thermosetting in stages, and to a multilayer plastic transparent substrate having good thermal and optical properties and manufactured by forming a separately produced thermosetting silsesquioxane coating layer on the surface of the substrate and sequentially hardening same. The plastic transparent substrate according to the present invention has little heat deformation under the processing temperatures used for existing display panels, is flexible, and has good light transmittance, so as to be used in various ways for liquid crystal displays