Device capable of regulating position of ion source in high-vacuum state and regulation method
The invention discloses a device capable of regulating the position of an ion source in a high-vacuum state and a regulation method. The device capable of regulating the position of the ion source in the high-vacuum state comprises the ion source, wherein the ion source is arranged in a shell; the s...
Gespeichert in:
Hauptverfasser: | , , , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The invention discloses a device capable of regulating the position of an ion source in a high-vacuum state and a regulation method. The device capable of regulating the position of the ion source in the high-vacuum state comprises the ion source, wherein the ion source is arranged in a shell; the shell is hollow inside; further, one end of the shell is open; a telescopic regulation device is arranged in the shell; further, the telescopic regulation device completely closes the open end of the shell; the telescopic regulation device is connected with the ion source; further, the telescopic regulation device can drive the ion source, along the axial direction of the shell, to move in the shell. According to the device and the method, the structure is firm; the overall length of the ion source can be precisely regulated; a regulation range is large; moreover, a component on the ion source is also easily disassembled and replaced; the replacement cost is decreased.
本发明公开了种在高真空状态下可调节离子源位置的装置及调节方法,包括设置在壳体中的离子源,所述壳 |
---|