Operating method and cleaning method for ion implantation apparatus

The invention relates to the technical field of ion implantation, and particularly to an operating method and a cleaning method for an ion implantation apparatus. The operating method comprises the following steps of an introducing step: introducing a process gas which slowly goes up to a preset flow; an applying step: applying an extraction voltage which slowly goes up to a preset voltage; and a judging step: judging whether the preset flow and the preset voltage achieve target values or not; and if the preset flow and the preset voltage both achieve the target values, stopping the process gas introducing and stopping the extraction voltage applying. By adoption of the operating method and the cleaning method for the ion implantation apparatus, an extraction electrode system of the ion source suffers from relatively low beam current impact, and the output voltage fluctuation is kept at an acceptable range; meanwhile, when the temperatures of the ion source, an electrode plate, a process cavity and the like r