Method for implant productivity enhancement

A method of processing a workpiece is disclosed, where the ion chamber is first coated with the desired dopant species and another species. Following this conditioning process, a feedgas, which comprises fluorine and the desired dopant, is introduced to the chamber and ionized. Ions are then extract...

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Bibliographische Detailangaben
Hauptverfasser: BHOSLE VIKRAM M, LEAVITT CHRISTOPHER J, KURUNCZI PETER F, FRONTIERO JOHN A, LEVAY WILLIAM T, BATEMAN NICHOLAS P. T, KOO BON-WOONG, MILLER TIMOTHY J, GRAFF JOHN W
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:A method of processing a workpiece is disclosed, where the ion chamber is first coated with the desired dopant species and another species. Following this conditioning process, a feedgas, which comprises fluorine and the desired dopant, is introduced to the chamber and ionized. Ions are then extracted from the chamber and accelerated toward the workpiece, where they are implanted without being first mass analyzed. The other species used during the conditioning process may be a Group 3, 4 or 5 element. The desired dopant species may be boron. 揭示种处理工件的方法,其中首先用所要掺杂剂物质和另物质来涂布离子室。在此调节过程之后,将原料气体引入到所述室中并使其离子化,所述原料气体包括氟和所要掺杂剂。接着从所述室提取离子并且使所述离子朝所述工件加速,其中所述离子未先经质量分析便植入。在调节过程期间使用的其他物质可为3族、4族或5族元素。所要掺杂剂物质可为硼。