Photoresist spray device

The invention discloses a photoresist spray device, which comprises a photoresist coating head. A cavity used for buffering a photoresist is arranged inside the middle part of an entrance of the photoresist coating head. A rotary neck used for adjusting flow of the photoresist is disposed inside the cavity. According to the photoresist coating head, multiple photoresist outlet branches are arranged between a bottom exit of the cavity and a nozzle. By widening a flow channel of the photoresist, a large amount of photoresist is buffered. In addition, adjustment of export volume of the photoresist and discharging of air at the exit are realized through the built-in rotary neck. The rotary neck provided by the invention is a fan-shaped cylindrical device. Under the pressure of the photoresist, a fan-shaped gap of the neck rotates downwards for a certain angle, and a large amount of the photoresist is buffered and then flows out of the exit. Thus, the effect of flow control can be achieved. Film thickness of the p