Functional film

The purpose of the present invention is to provide a functional film exhibiting excellent bending resistance and durability under high temperatures and high humidities. The present invention provides a functional film which includes a chemical composition represented by chemical formula (1) (in chem...

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Bibliographische Detailangaben
1. Verfasser:	ITO HIROHIDE
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CABLES CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOUNDS THEREOF CONDUCTORS DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INORGANIC CHEMISTRY INSULATORS METALLURGY NON-METALLIC ELEMENTS SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The purpose of the present invention is to provide a functional film exhibiting excellent bending resistance and durability under high temperatures and high humidities. The present invention provides a functional film which includes a chemical composition represented by chemical formula (1) (in chemical formula (1): M represents at least one element selected from the group consisting of the group 13 elements in the long-form periodic table; and w, x, y, and z are respectively the elemental ratio of M to silicon, the elemental ratio of oxygen to silicon, the elemental ratio of nitrogen to silicon, and the elemental ratio of carbon to silicon, and satisfy mathematical expressions (1)-(4), wherein the mathematical expression (1) is 0.01