Plasma spectral measurement device and method for SF6 mixed gas

The invention discloses a plasma spectral measurement device and method for SF6 mixed gas. The device is composed of an SF6 mixed gas charging, discharging and recycling device, an SF6 mixed gas arc plasma generation device and a spectrum detection device. The SF6 mixed gas charging, discharging and...

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Bibliographische Detailangaben
Hauptverfasser: ZHAO YISONG, LIN SHEN, HUANG XU, YANG LUYU, YANG HE, ZHU YIDONG, LU XUCHEN, LI XUEBIN, SHAN CHANGWANG, HAN HONGGANG
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention discloses a plasma spectral measurement device and method for SF6 mixed gas. The device is composed of an SF6 mixed gas charging, discharging and recycling device, an SF6 mixed gas arc plasma generation device and a spectrum detection device. The SF6 mixed gas charging, discharging and recycling device comprises two high-pressure gas cylinders used for storing SF6 gas and another kind of gas respectively, a mixed gas storage tank, a compressor, a filtration and absorption device, a vacuum pump and gas connecting pipelines. The SF6 mixed gas arc plasma generation device comprises two electrodes, a sealed gas chamber, a voltage regulator, a transformer, a water resistor and a connecting line. The method includes the following process steps that firstly, the mixed gas storage tank is vacuumized; secondly, the SF6 gas and the other kind of gas are fully mixed in the mixed gas storage tank; thirdly, the sealed gas chamber is vacuumized, and then the mixed gas is charged into the sealed gas chamber to