Preparation method for plasma grating based on pulse polarization rotation
The invention discloses a preparation method for plasma grating based on pulse polarization rotation. The method comprises the steps that femtosecond laser of linear polarization is divided into two pulses with equal energy; the first pulse penetrates through a half wave plate, and a first included...
Gespeichert in:
Hauptverfasser: | , , , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The invention discloses a preparation method for plasma grating based on pulse polarization rotation. The method comprises the steps that femtosecond laser of linear polarization is divided into two pulses with equal energy; the first pulse penetrates through a half wave plate, and a first included angle is formed between the polarization direction of the first pulse and the horizontal direction by rotating the optical axis of the half wave plate; the first pulse penetrates through a multi-stage wave plate, a second included angle is formed between the fast axis of the multi-stage wave plate and the horizontal direction, and delay is generated between subpulses projected by the first pulse in the horizontal direction and the perpendicular direction; the first pulse penetrates through a Berek phase compensating plate, a second included angle is formed between the horizontal direction and the fast axis of the Berek phase compensating plate by rotating a direction adjusting ring of the Berek phase compensating p |
---|