MANUFACTURING METHOD FOR SUBSTRATE HAVING LYOPHILIC PORTION AND LYOPHOBIC PORTION, APPLICATION, COMPOSITION, AND RADIO-SENSITIVE RESIN COMPOSITION

The invention provides a manufacturing method for a substrate having a lyophilic portion and a lyophobic portion and application thereof which are used for inhibiting wet diffusion and permeability of liquid film forming material so as to form a high fine pattern, and provides a composition and a ra...

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Bibliographische Detailangaben
Hauptverfasser: HAMAGUCHI, HITOSHI, TANAKA, KENROU
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention provides a manufacturing method for a substrate having a lyophilic portion and a lyophobic portion and application thereof which are used for inhibiting wet diffusion and permeability of liquid film forming material so as to form a high fine pattern, and provides a composition and a radio-sensitive resin composition. The manufacturing method for the substrate having the lyophilic portion and the lyophobic portion is achieved through the following steps: on the substrate, (1) coating the composition to form a coating film, wherein the composition contains (A) a polymer having at least one group of a group containing an acetal bond or a group containing a silicon atom, (B) an acid generating agent and a compound (C) different from (A); and (2) performing radiation of a predetermined part of the coating film. A method of forming a conductive film is realized in the following steps: after the step (2), coating a film forming material for the formation of a conductive film on a lyophilic portion in a