Treatment method of gas/solid mixture obtained through reaction of silicon, hydrogen and silicon tetrachloride, and apparatus thereof

The invention discloses a treatment method of a gas/solid mixture obtained through a reaction of silicon, hydrogen and silicon tetrachloride, and an apparatus thereof. The method comprises the following steps: 1, spraying a gas/solid mixture obtained in the production of trichlorosilane from silicon, hydrogen and silicon tetrachloride with liquid chlorosilane to respectively obtain a first gas mixture and a first residue slurry, wherein the first gas mixture includes trichlorosilane and silicon tetrachloride; 2, heating the first residue slurry to respectively obtain a second gas mixture and a second residue slurry; and 3, mixing the second gas mixture with the gas/solid mixture obtained in step 1, and repeating the step 1 to step 3 until the solid content of the second residue slurry reaches a preset solid content. The method allows the solid content of the second residue slurry to be arbitrarily controlled, meets the chlorosilane content requirement of a residue slurry to be treated in a subsequent treatmen