Filter unit and technique applicable to gas purification in organosilicon industry
The invention discloses a filter unit and technique applicable to gas purification in the organosilicon industry. The filter unit comprises a filter, a reverse pulse gas storage tank, a dust collection box and a control system, wherein a dusty gas inlet of the filter communicates with a dusty gas fe...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses a filter unit and technique applicable to gas purification in the organosilicon industry. The filter unit comprises a filter, a reverse pulse gas storage tank, a dust collection box and a control system, wherein a dusty gas inlet of the filter communicates with a dusty gas feed pipeline, and a clean gas outlet of the filter communicates with a clean gas discharge pipeline; the dusty gas feed pipeline and clean gas discharge pipeline are respectively provided with a feed control valve and a discharge control valve; the reverse pulse gas storage tank communicates with the filter through a nozzle gas collection pipeline which is provided with a pulse valve; the dust collection box communicates with a dust discharge port of the filter through a dust discharge pipeline which is provided with a slag discharge valve; and the control system is connected with the feed control valve, the discharge control valve, the pulse valve and the slag discharge valve, and is used for controlling the feed c |
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