Reticle transmittance measurement method, projection exposure device, and projection exposure method

A reticle transmittance measurement method, a projection exposure device, and a projection exposure method are disclosed. When a reticle is used first, the reticle is actually loaded in a projection exposure device and measured by one of oblique measurement and random measurement, thereby avoiding t...

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Bibliographische Detailangaben
Hauptverfasser:	GOMI YUTAKA, MURATA MICHIHIRO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A reticle transmittance measurement method, a projection exposure device, and a projection exposure method are disclosed. When a reticle is used first, the reticle is actually loaded in a projection exposure device and measured by one of oblique measurement and random measurement, thereby avoiding the fear of uneven sampling and determining the reticle transmittance of the entire reticle as the parent population without increasing the sampling count. The same effect can be obtained by making the measurement spot size, which is fixed in general, variable and by changing the angle of incidence in relation to the measurement spot size.