SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

There is to provide a semiconductor device and a method of manufacturing the same capable of improving avalanche resistance while suppressing an increase in an ON resistance. The semiconductor device includes a first semiconductor region of a first conductivity type, an element region, a terminal re...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: YAMASHITA, HIROAKI, IZUMISAWA, MASARU, OHTA, HIROSHI, OKUHATA, TAKASHI, ONO, SYOTARO
Format: Patent
Sprache:chi ; eng
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