Fin structure and forming method thereof

Fin structure and forming method thereof

The invention discloses a fin structure and a forming method thereof. The fin structure comprises a fin and a projection, wherein the fin and the projection are both located on a substrate; the projection has an irregular shape; and the height of the projection is smaller than that of the fin. The f...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: LIU ANQI, HUANG NANYUAN
Format: Patent
Sprache:chi ; eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:The invention discloses a fin structure and a forming method thereof. The fin structure comprises a fin and a projection, wherein the fin and the projection are both located on a substrate; the projection has an irregular shape; and the height of the projection is smaller than that of the fin. The fin structure and the forming method thereof can achieve purposes of avoiding fin falling down, over etching and the like.