SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND METHOD OF PROCESSING SUBSTRATE

The invention relates to a substrate processing apparatus, a method of manufacturing a semiconductor device, and a method of processing the substrate. The invention provides the technology for uniformly providing high exposed quantity gas for the substrate and carrying out process with high producti...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HIDEHARU ITATANI, SADAYOSHI HORII, MITSUHIRO HIRANO, MITSUNORI ISHISAKA, MOTONARI TAKEBAYASHI, SATOSHI TAKANO, YUICHI WADA, TETSUAKI INADA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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